Invention Grant
- Patent Title: Production of silicon through a closed-loop process
- Patent Title (中): 通过闭环工艺生产硅
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Application No.: US11735234Application Date: 2007-04-13
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Publication No.: US07780938B2Publication Date: 2010-08-24
- Inventor: Yakov E. Kutsovsky , Sheldon B. Davis
- Applicant: Yakov E. Kutsovsky , Sheldon B. Davis
- Applicant Address: US MA Boston
- Assignee: Cabot Corporation
- Current Assignee: Cabot Corporation
- Current Assignee Address: US MA Boston
- Main IPC: C01B33/027
- IPC: C01B33/027 ; C01B33/033 ; C01B33/03

Abstract:
The inventive method of producing silicon comprises reacting gaseous trichlorosilane with hydrogen to deposit silicon onto a substrate and to produce silicon tetrachloride by-product, vaporizing the silicon tetrachloride by-product to form gaseous silicon tetrachloride, converting the gaseous silicon tetrachloride to finely divided silicon, forming a silicon melt by melting the finely divided silicon, and forming solid silicon from the silicon melt.
Public/Granted literature
- US20070248521A1 PRODUCTION OF SILICON THROUGH A CLOSED-LOOP PROCESS Public/Granted day:2007-10-25
Information query
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