Invention Grant
- Patent Title: Positive photosensitive resin composition, cured layer , protecting layer, insulating layer and semiconductor device and display therewith
- Patent Title (中): 正型光敏树脂组合物,固化层,保护层,绝缘层和半导体器件,并显示
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Application No.: US12194634Application Date: 2008-08-20
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Publication No.: US07781131B2Publication Date: 2010-08-24
- Inventor: Hiroaki Makabe
- Applicant: Hiroaki Makabe
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Bakelite Co., Ltd.
- Current Assignee: Sumitomo Bakelite Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Obon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-214227 20070821
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
A positive-type photosensitive resin composition comprises (A) an alkali-soluble resin having at least a polybenzoxazole precursor structure, (B) a sensitizer, and (C) a cyclic compound having an alcoholic hydroxyl group. A protecting layer and an insulating layer include a cured layer which is a cured product of the positive-type photosensitive resin composition. A semiconductor device and a display device include the cured layer. According to the present invention, a highly reliable positive-type photosensitive resin composition can be obtained even when cured at a low temperature.
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