Invention Grant
- Patent Title: Compositions and processes for immersion lithography
- Patent Title (中): 浸没光刻的组成和工艺
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Application No.: US11173932Application Date: 2005-07-01
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Publication No.: US07781141B2Publication Date: 2010-08-24
- Inventor: Michael K. Gallagher , Gerald B. Wayton , Gregory P. Prokopowicz , Stewart A. Robertson
- Applicant: Michael K. Gallagher , Gerald B. Wayton , Gregory P. Prokopowicz , Stewart A. Robertson
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Angell Palmer & Dodge LLP
- Agent Peter F. Corless; Darryl P. Frickey
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/11 ; G03F7/20 ; G03F7/38
Abstract:
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
Public/Granted literature
- US20060105272A1 Compositions and processes for immersion lithography Public/Granted day:2006-05-18
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