Invention Grant
US07781147B2 Imide-urethane resin, photosensitive resin composition including the same and cured product
失效
酰亚胺基聚氨酯树脂,含有它的感光性树脂组合物和固化物
- Patent Title: Imide-urethane resin, photosensitive resin composition including the same and cured product
- Patent Title (中): 酰亚胺基聚氨酯树脂,含有它的感光性树脂组合物和固化物
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Application No.: US12083029Application Date: 2006-10-05
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Publication No.: US07781147B2Publication Date: 2010-08-24
- Inventor: Ryutaro Tanaka , Toru Kurihashi
- Applicant: Ryutaro Tanaka , Toru Kurihashi
- Applicant Address: JP Tokyo
- Assignee: Nippon Kayaku Kabushiki Kaisha
- Current Assignee: Nippon Kayaku Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Nields, Lemack & Frame, LLC
- Priority: JP2005-294452 20051007
- International Application: PCT/JP2006/319930 WO 20061005
- International Announcement: WO2007/043425 WO 20070419
- Main IPC: C08G18/67
- IPC: C08G18/67 ; C08G18/30 ; C08G7/038 ; B32B27/40 ; C08F90/06 ; G03F7/027 ; G03F7/038 ; G03F7/40

Abstract:
[PROBLEMS] To provide a photosensitive resin composition which has excellent photosensitivity and gives a cured product reduced in warpage and excellent in flexing properties, adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, resistance to gold plating, etc.[MEANS FOR SOLVING PROBLEMS] A urethane resin (A) soluble in aqueous alkali solutions and curable with active energy rays which is obtained by reacting a diisocyanate compound (a) with a tetrabasic acid dianhydride (b) to obtain a compound (E), reacting the compound (E) with a hydroxylated compound (c) having an unsaturated group and optionally with a hydroxylated compound (d) other than the compound (c) to obtain a compound (F), and further reacting hydroxy groups of the compound (F) with a diisocyanate compound (e).
Public/Granted literature
- US20080268373A1 Imide-Urethane Resin, Photosensitive Resin Composition Including the Same and Cured Product Public/Granted day:2008-10-30
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