Invention Grant
- Patent Title: Reduced pitch multiple exposure process
- Patent Title (中): 减少沥青多次曝光过程
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Application No.: US11387047Application Date: 2006-03-23
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Publication No.: US07781149B2Publication Date: 2010-08-24
- Inventor: Theodore Allen Paxton , Steven George Hansen , Cassandra May Owen , Todd J. Davis , Todd David Hiar , James J Hunter
- Applicant: Theodore Allen Paxton , Steven George Hansen , Cassandra May Owen , Todd J. Davis , Todd David Hiar , James J Hunter
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
Public/Granted literature
- US20060216653A1 Reduced pitch multiple exposure process Public/Granted day:2006-09-28
Information query
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