Invention Grant
- Patent Title: Electro-resistance element, electro-resistance memory using the same and method of manufacturing the same
- Patent Title (中): 电阻元件,使用该电阻元件的电阻存储器及其制造方法
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Application No.: US11683580Application Date: 2007-03-08
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Publication No.: US07781230B2Publication Date: 2010-08-24
- Inventor: Akihiro Odagawa , Yoshihisa Nagano
- Applicant: Akihiro Odagawa , Yoshihisa Nagano
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2006-110347 20060413
- Main IPC: B23B9/00
- IPC: B23B9/00

Abstract:
An electro-resistance element that has a different configuration from conventional elements and is excellent in both affinity with semiconductor manufacturing processes and resistance change characteristics is provided. An electro-resistance element has two or more states in which electric resistance values between a pair of electrodes and is switchable from one of the two or more states into another by applying a predetermined voltage or current between the electrodes. The electro-resistance element includes a substrate and a multilayer structure disposed on the substrate, the multilayer structure includes an upper electrode, a lower electrode and an electro-resistance layer disposed between the electrodes, wherein the electro-resistance layer includes Fe2O3, and Fe3O4 contained in an amount of 0% to 20% of Fe2O3 in percent by weight, the lower electrode is made of an iron oxide having a different composition from the electro-resistance layer and containing Fe3O4, and the electro-resistance layer and the lower electrode make contact with each other.
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