Invention Grant
- Patent Title: Alignment marker and lithographic apparatus and device manufacturing method using the same
- Patent Title (中): 对准标记和光刻设备及使用其的器件制造方法
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Application No.: US11147114Application Date: 2005-06-08
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Publication No.: US07781237B2Publication Date: 2010-08-24
- Inventor: Gert-Jan Heerens , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Frisco Klinkhamer , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Hubert Adriaan Van Mierlo , Willem Arthur Vliegenthart
- Applicant: Gert-Jan Heerens , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Frisco Klinkhamer , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Hubert Adriaan Van Mierlo , Willem Arthur Vliegenthart
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66
Abstract:
An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
Public/Granted literature
- US20060007442A1 Alignment marker and lithographic apparatus and device manufacturing method using the same Public/Granted day:2006-01-12
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