Invention Grant
- Patent Title: Method of producing wire-connection structure, and wire-connection structure
- Patent Title (中): 电线连接结构的制造方法,线连接结构
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Application No.: US11475876Application Date: 2006-06-28
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Publication No.: US07781324B2Publication Date: 2010-08-24
- Inventor: Hiroto Sugahara
- Applicant: Hiroto Sugahara
- Applicant Address: JP Nagoya-shi, Aichi-ken
- Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee Address: JP Nagoya-shi, Aichi-ken
- Agency: Baker Botts, LLP.
- Priority: JP2005-190947 20050630
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
For electrically connecting a wiring formed on one surface of an insulating substrate such as an FPC to an individual electrode arranged facing the other surface of the substrate, firstly, a through hole and a notch are formed by irradiating a laser beam from above onto the FPC. Next, the FPC is arranged to be positioned such that the individual electrode, the through hole and the notch are overlapped in a plan view. Next, an electroconductive liquid droplet having a diameter greater than a width of the notch is jetted, toward an area formed with the notch, from the one surface side of the FPC. The landed electroconductive liquid droplet flows along the notch in a thickness direction of the substrate due to an action of a capillary force and reaches assuredly to the individual electrode, thereby electrically connecting the wiring and electrode arranged sandwiching the insulating substrate assuredly.
Public/Granted literature
- US20070000970A1 Method of producing wire-connection structure, and wire-connection structure Public/Granted day:2007-01-04
Information query
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