Invention Grant
US07781602B2 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
有权
含氟环状化合物，可聚合的含氟单体，含氟聚合物，包含它们的抗蚀剂材料，以及与其形成图案的方法
- Patent Title: Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
- Patent Title (中): 含氟环状化合物，可聚合的含氟单体，含氟聚合物，包含它们的抗蚀剂材料，以及与其形成图案的方法
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Application No.: US11941433Application Date: 2007-11-16
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Publication No.: US07781602B2Publication Date: 2010-08-24
- Inventor: Haruhiko Komoriya , Shinichi Sumida , Katsunori Kawamura , Satoru Kobayashi , Satoru Miyazawa , Kazuhiko Maeda
- Applicant: Haruhiko Komoriya , Shinichi Sumida , Katsunori Kawamura , Satoru Kobayashi , Satoru Miyazawa , Kazuhiko Maeda
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2003-120921 20030425
- Main IPC: C07D313/00
- IPC: C07D313/00 ; C08F214/26 ; C08F18/20
Abstract:
The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
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