Invention Grant
- Patent Title: System and method for forming gas hydrates
- Patent Title (中): 用于形成气体水合物的系统和方法
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Application No.: US11679705Application Date: 2007-02-27
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Publication No.: US07781627B2Publication Date: 2010-08-24
- Inventor: Yang-Ho Woo , Ta-Kwan Woo
- Applicant: Yang-Ho Woo , Ta-Kwan Woo
- Applicant Address: KR Busan
- Assignee: Sungil Co., Ltd. (SIM)
- Current Assignee: Sungil Co., Ltd. (SIM)
- Current Assignee Address: KR Busan
- Agency: Portland IP Law LLC
- Priority: KR10-2006-0028624 20060329
- Main IPC: C07C9/00
- IPC: C07C9/00 ; B01J8/00

Abstract:
A system for forming gas hydrates includes a reactor adapted to receive a hydrate-forming fluid and a reaction fluid and react the hydrate-forming and reaction fluids within a reverse micellar solution to form gas hydrate particles; and a gas hydrate removal system coupled to the reactor, the gas hydrate removal system adapted to receive the gas hydrate particles within the reverse micellar solution and transport the gas hydrate particles away from the reactor. The gas hydrate removal system is adapted to transport gas hydrate particles away from the reactor concurrently with the formation of gas hydrate particles within the reactor.
Public/Granted literature
- US20070203374A1 SYSTEM AND METHOD FOR FORMING GAS HYDRATES Public/Granted day:2007-08-30
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