Invention Grant
US07781749B2 Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system
有权
具有深紫外光发射装置的光束照射装置,用于光刻图案检查系统
- Patent Title: Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system
- Patent Title (中): 具有深紫外光发射装置的光束照射装置,用于光刻图案检查系统
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Application No.: US12187770Application Date: 2008-08-07
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Publication No.: US07781749B2Publication Date: 2010-08-24
- Inventor: Shinichi Imai
- Applicant: Shinichi Imai
- Applicant Address: JP Yokohama-shi
- Assignee: Advanced Mask Inspection Technology, Inc.
- Current Assignee: Advanced Mask Inspection Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-250589 20070927
- Main IPC: G01J1/00
- IPC: G01J1/00 ; G01N21/00 ; G06K9/46

Abstract:
An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamental wave, a beam-shaper unit which performs beam-shaping of the fundamental wave so that this wave has a prespecified shape, and a pattern generator unit which operates, upon receipt of the beam-shaped fundamental wave, to convert this incoming wave into illumination light with a shorter wavelength to thereby generate illumination light of a prespecified shape. The illuminator also includes an image relay unit for guiding the illumination light that was generated by the pattern generator to fall onto a workpiece under inspection, such as a photomask or else.
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