Invention Grant
US07781749B2 Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system 有权
具有深紫外光发射装置的光束照射装置,用于光刻图案检查系统

Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system
Abstract:
An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamental wave, a beam-shaper unit which performs beam-shaping of the fundamental wave so that this wave has a prespecified shape, and a pattern generator unit which operates, upon receipt of the beam-shaped fundamental wave, to convert this incoming wave into illumination light with a shorter wavelength to thereby generate illumination light of a prespecified shape. The illuminator also includes an image relay unit for guiding the illumination light that was generated by the pattern generator to fall onto a workpiece under inspection, such as a photomask or else.
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