Invention Grant
US07781750B2 Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources
有权
用于光源的倾斜镜式正常入射收集器系统，特别是EUV等离子体放电源
- Patent Title: Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources
- Patent Title (中): 用于光源的倾斜镜式正常入射收集器系统，特别是EUV等离子体放电源
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Application No.: US10569574Application Date: 2003-08-27
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Publication No.: US07781750B2Publication Date: 2010-08-24
- Inventor: Wolfgang Singer
- Applicant: Wolfgang Singer
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- International Application: PCT/EP03/09466 WO 20030827
- International Announcement: WO2005/031748 WO 20050407
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G21K5/04
Abstract:
There is provided a collector system. The collector system includes a first collector mirror and a second collector mirror. The first collector mirror receives EUV light from a light source at a first aperture angle via a first beam path, and reflects the EUV light at a second aperture angle along a second beam path. The first aperture angle is larger than or substantially equal to the second aperture angle. The second mirror receives the EUV light from the first mirror at the second aperture angle. The collector is an oblique mirror type normal incidence mirror collector system.
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