Invention Grant
- Patent Title: Non-volatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US11947008Application Date: 2007-11-29
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Publication No.: US07781807B2Publication Date: 2010-08-24
- Inventor: Kiyohito Nishihara , Fumitaka Arai
- Applicant: Kiyohito Nishihara , Fumitaka Arai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-324471 20061130
- Main IPC: H01L29/80
- IPC: H01L29/80

Abstract:
A three-dimensional non-volatile semiconductor storage device which realizes both increased packing density and improved performance is disclosed. According to one aspect, there is provided a non-volatile semiconductor storage device comprising a first non-volatile memory cell provided on a first insulator, which includes a first semiconductor layer, and a first gate stack provided above the first semiconductor layer and including a first charge storage layer and a first control gate electrode, and a second non-volatile memory cell provided above the first non-volatile memory cell, which includes a second semiconductor layer, and a second gate stack provided above the second semiconductor layer and including a second charge storage layer and a second control gate electrode, the second gate stack being positioned to be aligned with the first gate stack, and wherein the first control gate electrode functions as a back gate electrode to the second non-volatile memory cell.
Public/Granted literature
- US20080128780A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2008-06-05
Information query
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