Invention Grant
- Patent Title: Nonvolatile magnetic memory device and photomask
- Patent Title (中): 非易失磁存储器件和光掩模
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Application No.: US12139923Application Date: 2008-06-16
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Publication No.: US07781816B2Publication Date: 2010-08-24
- Inventor: Hajime Yamagishi
- Applicant: Hajime Yamagishi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sonnenschein Nath & Rosenthal LLP
- Priority: JP2004-172122 20040610
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/94

Abstract:
A nonvolatile magnetic memory device including a magnetoresistance device having a recording layer formed of a ferromagnetic material for storing information by use of variation in resistance depending on the magnetization inversion state. The plan-view shape of the recording layer includes a pseudo-rhombic shape having four sides, at least two of the four sides each include a smooth curve having a central portion curved toward the center of the pseudo-rhombic shape. The easy axis of magnetization of the recording layer is substantially parallel to the longer axis of the pseudo-rhombic shape. The hard axis of magnetization of the recording layer is substantially parallel to the shorter axis of the pseudo-rhombic shape. The sides constituting the plan-view shape of the recording layer are smoothly connected to each other.
Public/Granted literature
- US20080253176A1 NONVOLATILE MAGNETIC MEMORY DEVICE AND PHOTOMASK Public/Granted day:2008-10-16
Information query
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