Invention Grant
- Patent Title: Hall effect device and method
- Patent Title (中): 霍尔效应器和方法
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Application No.: US12101271Application Date: 2008-04-11
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Publication No.: US07782050B2Publication Date: 2010-08-24
- Inventor: Udo Ausserlechner , Mario Motz
- Applicant: Udo Ausserlechner , Mario Motz
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: G01R33/07
- IPC: G01R33/07 ; H01L27/22

Abstract:
A semiconductor device including a Hall effect sensor and related method. The Hall effect device includes a substrate having a first conductivity type and an epitaxial layer having a second conductivity type defining a Hall effect portion. A conductive buried layer having the second conductivity type is situated between the epitaxial layer and the substrate. First and second output terminals and first and second voltage terminals are provided, with the second voltage terminal being coupled to the conductive buried layer.
Public/Granted literature
- US20090256559A1 HALL EFFECT DEVICE AND METHOD Public/Granted day:2009-10-15
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