Invention Grant
US07782262B2 Device for controlling the specific absorption rate of mass-produced radiant objects
有权
用于控制大量生产的辐射物体的比吸收率的装置
- Patent Title: Device for controlling the specific absorption rate of mass-produced radiant objects
- Patent Title (中): 用于控制大量生产的辐射物体的比吸收率的装置
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Application No.: US10568490Application Date: 2004-08-18
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Publication No.: US07782262B2Publication Date: 2010-08-24
- Inventor: Philippe Garreau , Luc Duchesne , Jean-Charles Bolomey
- Applicant: Philippe Garreau , Luc Duchesne , Jean-Charles Bolomey
- Applicant Address: FR
- Assignee: Societe d'Applications Technologiques de l'Imagerie Micro Ondes
- Current Assignee: Societe d'Applications Technologiques de l'Imagerie Micro Ondes
- Current Assignee Address: FR
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: FR0309994 20030818
- International Application: PCT/FR2004/002154 WO 20040818
- International Announcement: WO2005/019843 WO 20050303
- Main IPC: G01R29/10
- IPC: G01R29/10
Abstract:
The invention relates to a device for controlling the specific absorption rate of mass-produced radiant objects. The inventive device is characterized in that it comprises: at least one sensor for measuring a power radiated by an object which is located in the zone, and at least one processing unit for analyzing the power thus measured. The aforementioned sensor consist of a waveguide comprising an opening which is disposed opposite the test zone and at least one measuring probe which is disposed inside the waveguide.
Public/Granted literature
- US20070063905A1 Device for controlling the specific absorption rate of mass-produced radiant objects Public/Granted day:2007-03-22
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