Invention Grant
US07782389B2 System and method for varying exposure time for different parts of a field of view while acquiring an image
有权
用于在获取图像的同时对视野的不同部分改变曝光时间的系统和方法
- Patent Title: System and method for varying exposure time for different parts of a field of view while acquiring an image
- Patent Title (中): 用于在获取图像的同时对视野的不同部分改变曝光时间的系统和方法
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Application No.: US11556720Application Date: 2006-11-06
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Publication No.: US07782389B2Publication Date: 2010-08-24
- Inventor: Jason M. Neidrich
- Applicant: Jason M. Neidrich
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Charles A. Brill; Wade James Brady, III; Frederick J. Telecky, Jr.
- Main IPC: H04N5/225
- IPC: H04N5/225 ; H04N7/00

Abstract:
A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.
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