Invention Grant
US07782446B2 Stage system and lithographic apparatus comprising such stage system
有权
包括这种舞台系统的舞台系统和光刻设备
- Patent Title: Stage system and lithographic apparatus comprising such stage system
- Patent Title (中): 包括这种舞台系统的舞台系统和光刻设备
-
Application No.: US11712555Application Date: 2007-03-01
-
Publication No.: US07782446B2Publication Date: 2010-08-24
- Inventor: Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
- Applicant: Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/62
- IPC: G03B27/62 ; G03B27/58 ; G03B27/42 ; G03B27/32

Abstract:
A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.
Public/Granted literature
- US20080212054A1 Stage system and lithographic apparatus comprising such stage system Public/Granted day:2008-09-04
Information query