Invention Grant
- Patent Title: Method and device for measuring heights of patterns
- Patent Title (中): 用于测量图案高度的方法和装置
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Application No.: US12090137Application Date: 2006-10-12
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Publication No.: US07782468B2Publication Date: 2010-08-24
- Inventor: Alain Courteville
- Applicant: Alain Courteville
- Applicant Address: FR Nimes
- Assignee: Nanotec Solution
- Current Assignee: Nanotec Solution
- Current Assignee Address: FR Nimes
- Agency: Greer, Burns & Crain, Ltd.
- Priority: FR0510530 20051014
- International Application: PCT/FR2006/002296 WO 20061012
- International Announcement: WO2007/042676 WO 20070419
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01B9/02

Abstract:
A method for measuring the heights of patterns of an object, including: a light emission, the light includes a propagation mode of interest for at least one wavelength of interest, an illumination of the surface of the object by the light, a reflection of the light by the surface of the object, a collection of the reflected light, a division of the wavefront of the reflected light into division components, by at least one pattern of the illuminated surface, a filtering of the collected light, including a modal filtering removing all modes other than the propagation mode of interest, for the wavelengths of interest, and from the filtered light, and for the wavelengths of interest, an extraction of information about phase differences between the division components.
Public/Granted literature
- US20090303495A1 Method and device for measuring heights of patterns Public/Granted day:2009-12-10
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