Invention Grant
- Patent Title: Magnetic memory and memory cell thereof and method of manufacturing the memory cell
- Patent Title (中): 磁存储器及其存储单元及其制造方法
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Application No.: US11798160Application Date: 2007-05-10
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Publication No.: US07782659B2Publication Date: 2010-08-24
- Inventor: Chia-Hua Ho
- Applicant: Chia-Hua Ho
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A magnetic memory, a memory cell thereof, and a method of manufacturing the memory cell are provided. The memory cell of the magnetic memory includes a bottom contact layer, a bit line, a magnetic stack structure and a dielectric material. The bit line is disposed over the bottom contact layer. The magnetic stack structure is disposed between the bottom contact layer and the bit line. The dielectric material at least fills between the bottom contact layer and the bit line and surrounds the magnetic stack structure. A gap is formed between the dielectric material and the magnetic stack structure. During programming of the memory cell, the magnetic stack structure generates heat, and the gap delays heat loss.
Public/Granted literature
- US20080278995A1 Magnetic memory and memory cell thereof and method of manufacturing the memory cell Public/Granted day:2008-11-13
Information query
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