Invention Grant
US07782673B2 Semiconductor memory device which includes memory cell having charge accumulation layer and control gate
有权
半导体存储器件,其包括具有电荷累积层和控制栅极的存储单元
- Patent Title: Semiconductor memory device which includes memory cell having charge accumulation layer and control gate
- Patent Title (中): 半导体存储器件,其包括具有电荷累积层和控制栅极的存储单元
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Application No.: US11955831Application Date: 2007-12-13
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Publication No.: US07782673B2Publication Date: 2010-08-24
- Inventor: Hiroshi Maejima , Makoto Hamada
- Applicant: Hiroshi Maejima , Makoto Hamada
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A semiconductor memory device includes memory cells, a source line, a word line, a bit line, and a driver circuit. The memory cells are formed on a semiconductor layer and have a charge accumulation layer and a control gate on the charge accumulation layer. The word line is connected to gate of the memory cell. The bit line is electrically connected to a drain of the memory cell. The source line is electrically connected to a source of the memory cell. The driver circuit varies potential of the semiconductor layer in conjunction with potential of the source line.
Public/Granted literature
- US20090273976A1 SEMICONDUCTOR MEMORY DEVICE WHICH INCLUDES MEMORY CELL HAVING CHARGE ACCUMULATION LAYER AND CONTROL GATE Public/Granted day:2009-11-05
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