Invention Grant
- Patent Title: Laser apparatus and production method of laser apparatus
- Patent Title (中): 激光设备的激光设备及制作方法
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Application No.: US12206086Application Date: 2008-09-08
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Publication No.: US07782918B2Publication Date: 2010-08-24
- Inventor: Kenji Tamamori , Shinan Wang
- Applicant: Kenji Tamamori , Shinan Wang
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-074942 20060317
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
Provided are a laser apparatus into which a large current can be injected and a production method which enables easy production of the apparatus. A laser apparatus includes a light-emitting region on a substrate, and a periodic refractive index structure containing an i-type material provided at a periphery of the light-emitting region. Another laser apparatus includes a light-emitting region between a first electrode and a second electrode on a substrate, wherein at least one of the first and the second electrodes includes a periodic refractive index structure.
Public/Granted literature
- US20090052486A1 LASER APPARATUS AND PRODUCTION METHOD OF LASER APPARATUS Public/Granted day:2009-02-26
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