Invention Grant
- Patent Title: Arc monitoring system
- Patent Title (中): 电弧监控系统
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Application No.: US10573074Application Date: 2004-09-22
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Publication No.: US07783437B2Publication Date: 2010-08-24
- Inventor: Yoshihisa Oguchi , Kenichi Shimbo , Atsushi Suzuki , Toshiya Kumai , Hisaya Saitou
- Applicant: Yoshihisa Oguchi , Kenichi Shimbo , Atsushi Suzuki , Toshiya Kumai , Hisaya Saitou
- Applicant Address: JP Tokyo JP Nagoya-shi
- Assignee: Mitsubishi Denki Kabushiki Kaisha,Chubu Electric Power Co., Inc.
- Current Assignee: Mitsubishi Denki Kabushiki Kaisha,Chubu Electric Power Co., Inc.
- Current Assignee Address: JP Tokyo JP Nagoya-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-331883 20030924
- International Application: PCT/JP2004/013781 WO 20040922
- International Announcement: WO2005/029660 WO 20050331
- Main IPC: G01R31/00
- IPC: G01R31/00 ; G01M19/00

Abstract:
An arc monitor system locates an arc based on optimal frames from a frame obtained before an arc discharge to a frame obtained immediately after the arc discharge. The arc monitor system, used to locate an occurred place of an arc discharge that occurred in an electric facility, includes multiple monitor cameras arranged at multiple places in the electric facility, an image processing device that processes images received from the respective monitor cameras, a control logic section that controls the image processing device, and an operation device that includes a display section and an operation section and is connected to the control logic section. The image processing device and the control logic section extract a change in the images received from the monitor cameras in response to a control signal generated from the electric facility on an occurrence of the arc discharge, and then locate an occurred place of the arc discharge.
Public/Granted literature
- US20070108990A1 Arc monitoring system Public/Granted day:2007-05-17
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