Invention Grant
US07786512B2 Dense non-volatile memory array and method of fabrication 有权
密集的非易失性存储器阵列和制造方法

Dense non-volatile memory array and method of fabrication
Abstract:
A non-volatile memory array includes a multiplicity of memory cells, each of whose area is less than 4 F2 per cell (where F is a minimum feature size), and periphery elements to control the memory cells. The present invention also includes a non-volatile memory array which includes word lines and bit lines generally perpendicular to the word lines, with a word line pitch of less than 2 F. In one embodiment, the word lines are made of polysilicon spacers.
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