Invention Grant
- Patent Title: Dense non-volatile memory array and method of fabrication
- Patent Title (中): 密集的非易失性存储器阵列和制造方法
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Application No.: US11489747Application Date: 2006-07-18
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Publication No.: US07786512B2Publication Date: 2010-08-31
- Inventor: Ilan Bloom , Boaz Eitan , Rustom Irani
- Applicant: Ilan Bloom , Boaz Eitan , Rustom Irani
- Applicant Address: IL Netanya
- Assignee: Saifun Semiconductors Ltd.
- Current Assignee: Saifun Semiconductors Ltd.
- Current Assignee Address: IL Netanya
- Agency: Eitan Mehulal Law Group
- Main IPC: H01L27/10
- IPC: H01L27/10 ; H01L29/739 ; H01L29/73 ; H01L29/74 ; H01L23/48 ; H01L23/52 ; H01L29/40

Abstract:
A non-volatile memory array includes a multiplicity of memory cells, each of whose area is less than 4 F2 per cell (where F is a minimum feature size), and periphery elements to control the memory cells. The present invention also includes a non-volatile memory array which includes word lines and bit lines generally perpendicular to the word lines, with a word line pitch of less than 2 F. In one embodiment, the word lines are made of polysilicon spacers.
Public/Granted literature
- US20070051982A1 Dense non-volatile memory array and method of fabrication Public/Granted day:2007-03-08
Information query
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