Invention Grant
- Patent Title: Method for forming memory cell and device
- Patent Title (中): 用于形成存储单元和器件的方法
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Application No.: US12405574Application Date: 2009-03-17
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Publication No.: US07786522B2Publication Date: 2010-08-31
- Inventor: H. Montgomery Manning , David H. Wells
- Applicant: H. Montgomery Manning , David H. Wells
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/76 ; H01L29/94

Abstract:
A memory cell, device, and system include a memory cell having a shared digitline, a storage capacitor, and a plurality of access transistors configured to selectively electrically couple the storage capacitor with the shared digitline. The digitline couples with adjacent memory cells and the plurality of access transistor selects which adjacent memory cell is coupled to the shared digitline. A method of forming the memory cell includes forming a buried digitline in the substrate and a vertical pillar in the substrate immediately adjacent to the buried digitline. A dual gate transistor is formed on the vertical pillar with a first end electrically coupled to the buried digitline and a second end coupled to a storage capacitor formed thereto.
Public/Granted literature
- US20090173982A1 METHOD FOR FORMING MEMORY CELL AND DEVICE Public/Granted day:2009-07-09
Information query
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