Invention Grant
- Patent Title: Method for manufacturing a magnetic head
- Patent Title (中): 磁头制造方法
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Application No.: US11519451Application Date: 2006-09-11
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Publication No.: US07788795B2Publication Date: 2010-09-07
- Inventor: Kimitoshi Etoh , Hisako Takei , Masayuki Kurita , Yuji Kumazawa
- Applicant: Kimitoshi Etoh , Hisako Takei , Masayuki Kurita , Yuji Kumazawa
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Townsend and Townsend and Crew
- Agent Rambod Nader
- Priority: JP2005-265752 20050913
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A method for manufacturing a magnetic head that is effective for the suppression of thermal protrusion. The magnetic head includes SiO2, Si nitride, or Si oxide as a coil insulator having a low coefficient of thermal expansion and high workability. The coil insulator is arranged at a position away from the air bearing surface and the air bearing surface is made of alumina, making slider processing easy.
Public/Granted literature
- US20070064344A1 Magnetic head with coil insulator and method for manufacturing the same Public/Granted day:2007-03-22
Information query
IPC分类: