Invention Grant
- Patent Title: Method FPR manufacturing a magnetic write head
- Patent Title (中): 磁写头制造方法
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Application No.: US11611824Application Date: 2006-12-15
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Publication No.: US07788796B2Publication Date: 2010-09-07
- Inventor: Wen-Chien David Hsiao , Ming Jiang , Vladimir Nikitin , Aron Pentek , Yi Zheng
- Applicant: Wen-Chien David Hsiao , Ming Jiang , Vladimir Nikitin , Aron Pentek , Yi Zheng
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A method for constructing a magnetic write head using an electrical lapping guide to carefully control critical dimensions during a lapping operation used to define an air bearing surface. The lapping guide is photolithograhically patterned in a common photolithographic step with another write head structure so that special relation between the lapping guide and critical dimensions of the write head structure can be carefully maintained. The electrical lapping guide can be patterned in a common photolithographic step as the write pole so that the location of the flare point can be carefully controlled with respect to the location of the lapping guide. A stitched flare structure can also be built together with the electrical lapping guide, then a self-aligned shield can be further built over this stitched flare structure so that both flare point and shield throat can be controlled tightly together by this electrical lapping guide during lapping process.
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