Invention Grant
- Patent Title: Process for producing substrate
- Patent Title (中): 生产基材的方法
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Application No.: US11565973Application Date: 2006-12-01
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Publication No.: US07788948B2Publication Date: 2010-09-07
- Inventor: Jiro Chiba , Atsuo Hiroi , Ryosuke Sugiura , Ryoji Akiyama , Masaya Matsunaga
- Applicant: Jiro Chiba , Atsuo Hiroi , Ryosuke Sugiura , Ryoji Akiyama , Masaya Matsunaga
- Applicant Address: JP Tokyo JP Funabashi-shi
- Assignee: Asahi Glass Company, Limited,Asahi Techno Glass Corporation
- Current Assignee: Asahi Glass Company, Limited,Asahi Techno Glass Corporation
- Current Assignee Address: JP Tokyo JP Funabashi-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-357894 20051212
- Main IPC: C03B19/01
- IPC: C03B19/01 ; C03B19/09

Abstract:
To provide a process for producing a reliable substrate in good yield, by suppressing bleeding of boric acid from a green sheet comprising a powder of borosilicate glass to improve printability of a conductive pattern thereby to prevent disconnection.A process for producing a substrate which comprises firing a green sheet comprising a powder of borosilicate glass, wherein the powder is one prepared by holding borosilicate glass before pulverization, at a temperature higher by at least 30° C. than the glass transition temperature and lower by at most 50° C. than the softening point of the borosilicate glass for at least 3 hours in the atmosphere, followed by pulverization.
Public/Granted literature
- US20070130993A1 PROCESS FOR PRODUCING SUBSTRATE Public/Granted day:2007-06-14
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