Invention Grant
- Patent Title: Lid opening/closing system for closed container and substrate processing method using same
- Patent Title (中): 封闭容器盖板开闭系统及基板加工方法
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Application No.: US12106619Application Date: 2008-04-21
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Publication No.: US07789609B2Publication Date: 2010-09-07
- Inventor: Tsutomu Okabe , Jun Emoto
- Applicant: Tsutomu Okabe , Jun Emoto
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-198618 20070731
- Main IPC: B65G1/12
- IPC: B65G1/12
Abstract:
Adjacent to an opening portion 10 in an FIMS system is provided an enclosure that encloses the operation space of a door and has a second opening portion 31 opposed to the opening portion 10. A curtain nozzle is provided above the upper edge of the opening portion 10 in the upper portion in the enclosure. A purge gas is supplied from the curtain nozzle along a direction from the upper edge to the lower edge of the opening portion. In addition, a gas outlet through which the purge gas flows from the interior of the enclosure out into the exterior is provided on the wall of the enclosure to which the purge gas flowing in the above described direction is directed, whereby an increase in the partial pressure of oxidizing gases in the interior of the FOUP is prevented.
Public/Granted literature
- US20090035099A1 LID OPENING/CLOSING SYSTEM FOR CLOSED CONTAINER AND SUBSTRATE PROCESSING METHOD USING SAME Public/Granted day:2009-02-05
Information query
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