Invention Grant
- Patent Title: Aligner
- Patent Title (中): 对齐者
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Application No.: US11917076Application Date: 2006-05-25
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Publication No.: US07789614B2Publication Date: 2010-09-07
- Inventor: Keisuke Yoshino , Mitsuaki Hagio , Shin Osaki , Yoshihiro Kusama
- Applicant: Keisuke Yoshino , Mitsuaki Hagio , Shin Osaki , Yoshihiro Kusama
- Applicant Address: JP Kitakyushu-shi, Fukuoka
- Assignee: Kabushiki Kaisha Yaskawa Denki
- Current Assignee: Kabushiki Kaisha Yaskawa Denki
- Current Assignee Address: JP Kitakyushu-shi, Fukuoka
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2005-171772 20050613
- International Application: PCT/JP2006/310433 WO 20060525
- International Announcement: WO2006/134760 WO 20061221
- Main IPC: H01L21/68
- IPC: H01L21/68 ; B66C1/42 ; C23C16/00

Abstract:
It is an object to provide an aligner for centering a wafer and adjusting an angle of a notch or the like of the wafer while gripping edges of the wafer capable of attaining a shortened takt time and miniaturization of the apparatus by employing a mechanism capable of infinite rotation without being restricted by a rotational range, by eliminating cables and/or tubes at the rotating portion. The link mechanism for causing opening and closing movements of the gripping mechanism for gripping a wafer 1 is supported via a bearing 14 with respect to the link mechanism driving portion for driving the link mechanism so that only the gripping portion and the link mechanism can be rotated.
Public/Granted literature
- US20090053029A1 ALIGNER Public/Granted day:2009-02-26
Information query
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