An inter-transverse process spacer system comprises a first spacer device. The first spacer device comprises opposing end portions. The first spacer device is adapted for insertion between a first pair of adjacent transverse processes, and the opposing end portions of the first spacer device are adapted to engage the first pair of adjacent transverse processes. The inter-transverse process spacer system further comprises a first connection device connected to the first spacer device and adapted to engage at least one of the first pair of adjacent transverse processes.