Invention Grant
- Patent Title: Hydrogen separation membrane, sputtering target for forming said hydrogen separation membrane, and manufacturing method thereof
- Patent Title (中): 氢分离膜,用于形成所述氢分离膜的溅射靶及其制造方法
-
Application No.: US11719220Application Date: 2005-11-04
-
Publication No.: US07789948B2Publication Date: 2010-09-07
- Inventor: Atsushi Nakamura , Masataka Yahagi , Akihisa Inoue , Hisamichi Kimura , Shin-ichi Yamaura
- Applicant: Atsushi Nakamura , Masataka Yahagi , Akihisa Inoue , Hisamichi Kimura , Shin-ichi Yamaura
- Applicant Address: JP Tokyo JP Miyagi
- Assignee: Nippon Mining & Metals Co., Ltd,Tohoku University
- Current Assignee: Nippon Mining & Metals Co., Ltd,Tohoku University
- Current Assignee Address: JP Tokyo JP Miyagi
- Agency: Howson & Howson LLP
- Priority: JP2004-330308 20041115
- International Application: PCT/JP2005/020277 WO 20051104
- International Announcement: WO2006/051736 WO 20060518
- Main IPC: B01D53/22
- IPC: B01D53/22

Abstract:
Provided is a hydrogen separation membrane characterized by comprising a structure obtained by sintering atomized powder having a composition of NixMyZr100-x-y (wherein M is Nb and/or Ta, 25≦x≦40, 25≦y≦40) and an average grain size of 50 μm or less. The prepared hydrogen separation membrane does not require the use of costly Pd metal, and can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This hydrogen separation membrane is free from problems such as defects in the hydrogen separation membrane and unevenness of composition, has a uniform structure, and is capable of separating hydrogen at low cost. Further provided are a sputtering target for forming such as hydrogen separation membrane and its manufacturing method.
Public/Granted literature
Information query
IPC分类: