Invention Grant
- Patent Title: Method of cleaning UV irradiation chamber
- Patent Title (中): 紫外线照射室的清洗方法
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Application No.: US11857639Application Date: 2007-09-19
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Publication No.: US07789965B2Publication Date: 2010-09-07
- Inventor: Kiyohiro Matsushita , Hideaki Fukuda , Kenichi Kagami
- Applicant: Kiyohiro Matsushita , Hideaki Fukuda , Kenichi Kagami
- Applicant Address: JP Toyko
- Assignee: ASM Japan K.K.
- Current Assignee: ASM Japan K.K.
- Current Assignee Address: JP Toyko
- Agency: Knobbe, Martens, Olson, & Bear LLP
- Main IPC: B08B7/04
- IPC: B08B7/04

Abstract:
A method of cleaning a UV irradiation chamber includes steps of: (i) after completion of irradiating a substrate with UV light transmitted through an optical transmitted window provided in the UV irradiation chamber, generating radical species of a cleaning gas outside the UV irradiation chamber; and (ii) introducing the radical species from the outside of the UV irradiation chamber into the UV irradiation chamber, thereby cleaning the optical transmitted window.
Public/Granted literature
- US20080066778A1 METHOD OF CLEANING UV IRRADIATION CHAMBER Public/Granted day:2008-03-20
Information query
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