Invention Grant
- Patent Title: Methods and apparatus for cleaning chamber components
- Patent Title (中): 清洁腔室部件的方法和设备
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Application No.: US11931272Application Date: 2007-10-31
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Publication No.: US07789969B2Publication Date: 2010-09-07
- Inventor: Felix Rabinovich , Thomas Echols , Janet Maleski , Ning Chen , Samantha S. H. Tan
- Applicant: Felix Rabinovich , Thomas Echols , Janet Maleski , Ning Chen , Samantha S. H. Tan
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Dugan & Dugan, PC
- Main IPC: B08B5/04
- IPC: B08B5/04 ; B08B9/00 ; B08B3/00
Abstract:
In a first aspect, a method for cleaning a semiconductor fabrication chamber component having an orifice is provided. The method includes (A) placing the component into a bath having a cleaning solution; (B) flowing a fluid into the orifice thereby maintaining at least a first portion of the orifice free from cleaning solution while the cleaning solution cleans the component; and (C) withdrawing the fluid from the orifice such that cleaning solution enters into the first portion of the orifice and cleans the first portion of the orifice. Numerous other aspects are also provided.
Public/Granted literature
- US20080099054A1 METHODS AND APPARATUS FOR CLEANING CHAMBER COMPONENTS Public/Granted day:2008-05-01
Information query
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