Invention Grant
- Patent Title: Substrate holder for a vapour deposition system
- Patent Title (中): 用于气相沉积系统的基板支架
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Application No.: US11205513Application Date: 2005-08-17
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Publication No.: US07790004B2Publication Date: 2010-09-07
- Inventor: Richard I. Seddon
- Applicant: Richard I. Seddon
- Applicant Address: US CA Milpitas
- Assignee: JDS Uniphase Corporation
- Current Assignee: JDS Uniphase Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Pequignot + Myers LLC
- Agent Matthew A. Pequignot
- Main IPC: C25B9/00
- IPC: C25B9/00 ; C23C14/00 ; C25B11/00 ; C25B13/00 ; C23C16/00

Abstract:
The invention relates to a partially disposable substrate holder used in magnetic latches for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The substrate holder includes a reusable base formed, at least partially, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, which encourages adherence of coating material and has a low vapor pressure at coating temperatures.
Public/Granted literature
- US20060049044A1 Substrate holder for a vapour deposition system Public/Granted day:2006-03-09
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