Invention Grant
US07790042B2 Method for the removal of submicron particulates from chlorinated water by sequentially adding a cationic polymer followed by adding an anionic polymer
有权
通过依次加入阳离子聚合物然后加入阴离子聚合物从氯化水中除去亚微米颗粒的方法
- Patent Title: Method for the removal of submicron particulates from chlorinated water by sequentially adding a cationic polymer followed by adding an anionic polymer
- Patent Title (中): 通过依次加入阳离子聚合物然后加入阴离子聚合物从氯化水中除去亚微米颗粒的方法
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Application No.: US11355240Application Date: 2006-02-15
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Publication No.: US07790042B2Publication Date: 2010-09-07
- Inventor: Everett J. Nichols , Jeffrey F. Williams , James R. Scott , Christine M. Palczewski
- Applicant: Everett J. Nichols , Jeffrey F. Williams , James R. Scott , Christine M. Palczewski
- Applicant Address: US WA Bothell
- Assignee: HaloSource, Inc.
- Current Assignee: HaloSource, Inc.
- Current Assignee Address: US WA Bothell
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Main IPC: C02F1/54
- IPC: C02F1/54 ; C02F103/42
Abstract:
A method for removing submicron colloidal particulates, such as hydrocarbons, from water. The method includes first adding a soluble, cationic polymer, such as chitosan, a salt, or solution of chitosan to water containing the submicron particulates and a halogenating agent, followed by adding a soluble, anionic polymer or anionic salt to the water. The resulting flocs are filtered to remove the submicron particulates.
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