Invention Grant
US07790337B2 Photomask, pattern formation method using the same and mask data creation method
失效
光掩模，使用相同的图案形成方法和掩模数据创建方法
- Patent Title: Photomask, pattern formation method using the same and mask data creation method
- Patent Title (中): 光掩模，使用相同的图案形成方法和掩模数据创建方法
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Application No.: US11701511Application Date: 2007-02-02
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Publication No.: US07790337B2Publication Date: 2010-09-07
- Inventor: Akio Misaka
- Applicant: Akio Misaka
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-027592 20060203
- Main IPC: G03F1/00
- IPC: G03F1/00 ; H01L21/00
Abstract:
A principal pattern made of a plurality of isolated transparent portions is formed in a light-shielding portion disposed on a transparent substrate having a transparent property against exposing light. The principal pattern includes a first principal pattern and a second principal pattern adjacent to each other at a given distance, and a first auxiliary pattern made of a phase shifter portion for transmitting the exposing light in an opposite phase to the exposing light passing through the transparent portion is formed between the first principal pattern and the second principal pattern.
Public/Granted literature
- US20070184361A1 Photomask, pattern formation method using the same and mask data creation method Public/Granted day:2007-08-09
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