Invention Grant
- Patent Title: Laser mask and method of crystallization using the same
- Patent Title (中): 激光掩模和使用其的结晶方法
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Application No.: US12076120Application Date: 2008-03-13
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Publication No.: US07790341B2Publication Date: 2010-09-07
- Inventor: JaeSung You
- Applicant: JaeSung You
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2004-0025900 20040414
- Main IPC: G03F1/00
- IPC: G03F1/00 ; C30B28/08

Abstract:
Provided is a method for crystallizing using a laser mask for selectively crystallizing active regions without a laser shot mark, including: providing an array substrate in which N×M active regions are defined; positioning a laser mask having first and second blocks over the substrate, wherein the first and second blocks have first and second mask patterns, respectively, and the second mask pattern is a reverse pattern of the first mask pattern; irradiating a first laser beam onto the active regions through the first block; and irradiating a second laser beam onto the active regions through the second block.
Public/Granted literature
- US20080166668A1 Laser mask and method of crystallization using the same Public/Granted day:2008-07-10
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