Invention Grant
- Patent Title: Manufacturing process for a chip package structure
- Patent Title (中): 芯片封装结构的制造工艺
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Application No.: US12270627Application Date: 2008-11-13
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Publication No.: US07790514B2Publication Date: 2010-09-07
- Inventor: Geng-Shin Shen , Chun-Ying Lin
- Applicant: Geng-Shin Shen , Chun-Ying Lin
- Applicant Address: TW Hsinchu BM Hamilton
- Assignee: ChipMOS Technologies Inc.,ChipMOS Technologies (Bermuda) Ltd.
- Current Assignee: ChipMOS Technologies Inc.,ChipMOS Technologies (Bermuda) Ltd.
- Current Assignee Address: TW Hsinchu BM Hamilton
- Agency: J.C. Patents
- Priority: TW94124656A 20050721
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
A manufacturing process for a chip package structure is provided. First, a patterned conductive layer having a plurality of first openings and a first patterned solder resist layer on the patterned conductive layer are provided. A second patterned solder resist layer is formed on the patterned conductive layer such that the first patterned solder resist layer and the second patterned solder resist layer are disposed at two opposite surfaces of the patterned conductive layer. Chips are bonded onto the first patterned solder resist layer such that the first patterned solder resist layer is between the chips and the patterned conductive layer. The chips are electrically connected to the patterned conductive layer by a plurality of bonding wires passing through the first openings. At least one molding compound is formed and the molding compound, the first patterned solder resist layer and the second patterned solder resist layer are separated.
Public/Granted literature
- US20090068793A1 MANUFACTURING PROCESS FOR A CHIP PACKAGE STRUCTURE Public/Granted day:2009-03-12
Information query
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