Invention Grant
US07790533B2 Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
激光照射方法,激光照射装置以及半导体装置的制造方法

Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
Abstract:
The present invention is to provide a technique that can increase productivity with high output power by combining a plurality of laser beams on an irradiation surface without any difficulties in optical alignment. According to this technique, laser beams having different wavelengths are combined using a plurality of laser oscillators and a dichroic mirror, or additionally a polarizer. For example, a first laser beam emitted from a first laser oscillator is combined with a second laser beam emitted from a second laser oscillator having different wavelength from the first laser beam in such a way that the first laser beam passes through a dichroic mirror and the second laser beam is reflected on the dichroic mirror, and the combined laser beam is projected to an irradiation surface.
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