Invention Grant
US07790569B2 Production of semiconductor substrates with buried layers by joining (bonding) semiconductor wafers
失效
通过接合(接合)半导体晶片生产具有掩埋层的半导体衬底
- Patent Title: Production of semiconductor substrates with buried layers by joining (bonding) semiconductor wafers
- Patent Title (中): 通过接合(接合)半导体晶片生产具有掩埋层的半导体衬底
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Application No.: US10580361Application Date: 2004-11-29
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Publication No.: US07790569B2Publication Date: 2010-09-07
- Inventor: Roy Knechtel , Andrej Lenz
- Applicant: Roy Knechtel , Andrej Lenz
- Applicant Address: DE Erfurt
- Assignee: X-FAB Semiconductor Foundries AG
- Current Assignee: X-FAB Semiconductor Foundries AG
- Current Assignee Address: DE Erfurt
- Agency: Stevens & Showalter LLP
- Priority: DE10355728 20031128
- International Application: PCT/DE2004/002638 WO 20041129
- International Announcement: WO2005/053018 WO 20050609
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
The invention relates to a method for producing semiconductor substrates by bonding. The aim of said method is to reduce the non-usable edge region on the bonded wafer component and to improve the edge geometry of the wafer composite. This is achieved by a method for joining two semiconductor wafers using a semiconductor wafer bonding process. The surfaces of the two semiconductor wafers that are to be bonded are provided with a border or edge geometry that has a special short front-end facet. After the bonding process, one of the two wafers is ablated to obtain an edge region that is as devoid as possible of defects and a usable wafer surface that is as large as possible.
Public/Granted literature
- US20080036041A1 Production Of Semiconductor Substrates With Buried Layers By Joining (Bonding) Semiconductor Wafers Public/Granted day:2008-02-14
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