Invention Grant
- Patent Title: Pellicle and novel fluoropolymer
- Patent Title (中): 薄膜和新型含氟聚合物
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Application No.: US11446242Application Date: 2006-06-05
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Publication No.: US07790811B2Publication Date: 2010-09-07
- Inventor: Ikuo Matsukura , Hiromasa Yamamoto , Yuichiro Ishibashi , Shinji Okada , Naoko Shirota
- Applicant: Ikuo Matsukura , Hiromasa Yamamoto , Yuichiro Ishibashi , Shinji Okada , Naoko Shirota
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-404403 20031203; JP2004-120237 20040415; JP2004-225707 20040802
- Main IPC: C08F114/18
- IPC: C08F114/18

Abstract:
A useful fluoropolymer excellent in transparency and durability to a short wavelength light (an ArF excimer laser having an irradiation wavelength of 193 nm and a F2 excimer laser having an irradiation wavelength of 157 nm) as e.g. a pellicle material, wherein a polymer (I) to be used for a pellicle membrane and/or an adhesive is a polymer essentially containing the following fluorine atom-containing unit (1), wherein a chain forming the polymer main chain comprises a carbon atom and an etheric oxygen atom, at least one carbon atom forming the main chain is a carbon atom forming a cyclic group, and at least one etheric oxygen atom forming the main chain is an oxygen atom forming no cyclic group.
Public/Granted literature
- US20060240222A1 Pellicle and novel fluoropolymer Public/Granted day:2006-10-26
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