Invention Grant
- Patent Title: Hermetic sealing cap, electronic component accommodation package, and method for producing hermetic sealing cap
- Patent Title (中): 密封盖,电子元件住宿包,以及密封盖生产方法
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Application No.: US11915914Application Date: 2007-02-13
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Publication No.: US07790988B2Publication Date: 2010-09-07
- Inventor: Tsuyoshi Tanaka , Masaharu Yamamoto
- Applicant: Tsuyoshi Tanaka , Masaharu Yamamoto
- Applicant Address: JP Suita-shi
- Assignee: Neomax Materials Co., Ltd.
- Current Assignee: Neomax Materials Co., Ltd.
- Current Assignee Address: JP Suita-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2006-037767 20060215
- International Application: PCT/JP2007/052461 WO 20070213
- International Announcement: WO2007/094284 WO 20070823
- Main IPC: H01L23/02
- IPC: H01L23/02 ; H05K5/06

Abstract:
A hermetic sealing cap can be provided which is capable of suppressing that a production process becomes complicated, and additionally of suppressing that a solder layer wetly spreads inward on a sealing surface. This hermetic sealing cap (1, 30) includes a base member (2), a first plating layer (3, 31) that is formed on the surface of the base member, and a second plating layer (4, 32) that is formed on the surface of the first plating layer and is less oxidized than the first plating layer, wherein a part of the second plating layer in an area (S1, S5) inside an area (S2, S6) to which an electronic component accommodation member is joined is removed so that the surface of the first plating layer is exposed, and the surface of the first plating layer that is exposed in the area from which the second plating layer is removed is oxidized.
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