Invention Grant
- Patent Title: Planar inductor and method of manufacturing it
- Patent Title (中): 平面电感及其制造方法
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Application No.: US11579747Application Date: 2005-05-09
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Publication No.: US07791165B2Publication Date: 2010-09-07
- Inventor: Kazuaki Tanaka
- Applicant: Kazuaki Tanaka
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: EP04076429 20040513
- International Application: PCT/EP2005/005129 WO 20050509
- International Announcement: WO2005/114684 WO 20051201
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
A planar inductor comprises a metal element (11-14) on a substrate (300, 310), said metal element being provided with at least one groove (20) extending along and into said element from at least one surface (2) of said element. Said groove or grooves (20) extend into the element in a direction substantially perpendicular to the surface of the substrate (300, 310), giving rise to a higher Q value and a lower serial resistance are also achieved. The inductor may comprise grooved (11, 13, 14) and non-grooved (12) layers.The invention also relates to a method of manufacturing the inductor.
Public/Granted literature
- US20080157272A1 Planar Inductor And Method Of Manufacturing It Public/Granted day:2008-07-03
Information query
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