Invention Grant
- Patent Title: Approach to high temperature wafer processing
- Patent Title (中): 接近高温晶圆加工
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Application No.: US12055823Application Date: 2008-03-26
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Publication No.: US07791200B2Publication Date: 2010-09-07
- Inventor: Richard A. Davis
- Applicant: Richard A. Davis
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Main IPC: H01L21/46
- IPC: H01L21/46 ; H01L23/485

Abstract:
At temperatures near, and above, 385° C., gold can diffuse into silicon and into some contact materials. Gold, however, is an excellent material because it is corrosion resistant, electrically conductive, and highly reliable. Using an adhesion layer and removing gold from the contact area above and around a contact allows a Micro-Electro-Mechanical Systems device or semiconductor to be subjected to temperatures above 385° C. without risking gold diffusion. Removing the risk of gold diffusion allows further elevated temperature processing. Bonding a device substrate to a carrier substrate can be an elevated temperature process.
Public/Granted literature
- US20090243107A1 NOVEL APPROACH TO HIGH TEMPERATURE WAFER PROCESSING Public/Granted day:2009-10-01
Information query
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