Invention Grant
- Patent Title: Inductor device and method of manufacturing the same
- Patent Title (中): 电感器件及其制造方法
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Application No.: US12186317Application Date: 2008-08-05
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Publication No.: US07791446B2Publication Date: 2010-09-07
- Inventor: Tomoharu Fujii , Masahiro Sunohara , Manabu Nakamura
- Applicant: Tomoharu Fujii , Masahiro Sunohara , Manabu Nakamura
- Applicant Address: JP Nagano-shi, Nagano
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano-shi, Nagano
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2007-204325 20070806
- Main IPC: H01F5/00
- IPC: H01F5/00
Abstract:
An inductor device formed on a semiconductor substrate includes an inductor body penetrating the semiconductor substrate, taking a spiral shape and having a conductivity, and an insulating film provided between a side surface of the inductor body and the semiconductor substrate.
Public/Granted literature
- US20090039999A1 INDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-02-12
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