Invention Grant
US07791710B2 System and method for determining maximum operational parameters used in maskless applications
有权
用于确定无掩模应用中使用的最大操作参数的系统和方法
- Patent Title: System and method for determining maximum operational parameters used in maskless applications
- Patent Title (中): 用于确定无掩模应用中使用的最大操作参数的系统和方法
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Application No.: US11546905Application Date: 2006-10-13
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Publication No.: US07791710B2Publication Date: 2010-09-07
- Inventor: Martinus Hendricus Hoeks
- Applicant: Martinus Hendricus Hoeks
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/54
Abstract:
A lithographic method and apparatus for determining operational parameters of a maskless lithography tool. In an embodiment, an amount of data in a datapath of the maskless lithography system is reduced. A maximum value of at least one operational parameter of the maskless lithography system is determined responsive to the reduced amount of data in the datapath.
Public/Granted literature
- US20070030472A1 System and method for determining maximum operational parameters used in maskless applications Public/Granted day:2007-02-08
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