Invention Grant
- Patent Title: Surface inspection with variable digital filtering
- Patent Title (中): 可变数字滤波表面检测
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Application No.: US11878197Application Date: 2007-07-23
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Publication No.: US07791721B2Publication Date: 2010-09-07
- Inventor: Kazuo Takahashi , Takahiro Jingu
- Applicant: Kazuo Takahashi , Takahiro Jingu
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-207342 20060731
- Main IPC: G01N21/88
- IPC: G01N21/88

Abstract:
A semiconductor wafer, which is an inspection object, is stuck by vacuum on a chuck and this chuck is mounted on an inspection object movement stage consisting of a rotational stage and a translational stage, located on a Z-stage. The rotational stage provides a rotational movement and the translational stage provides a translational movement. And when a foreign particle or a defect on an inspection object surface is detected, the parameter of digital filtering is dynamically changed during inspection, and the foreign particle or the defect is differentiated using the result after removing a low frequency fluctuation component to be a noise component.
Public/Granted literature
- US20080027665A1 Surface inspection apparatus and surface inspection method Public/Granted day:2008-01-31
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