Invention Grant
US07791823B2 Substrate with recess portion for microlens, microlens substrate, transmissive screen, rear type projector, and method of manufacturing substrate with recess portion for microlens
有权
具有用于微透镜的凹部的基板，微透镜基板，透射屏幕，后部型投影仪以及用于微透镜的凹部的基板的制造方法
- Patent Title: Substrate with recess portion for microlens, microlens substrate, transmissive screen, rear type projector, and method of manufacturing substrate with recess portion for microlens
- Patent Title (中): 具有用于微透镜的凹部的基板，微透镜基板，透射屏幕，后部型投影仪以及用于微透镜的凹部的基板的制造方法
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Application No.: US11562762Application Date: 2006-11-22
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Publication No.: US07791823B2Publication Date: 2010-09-07
- Inventor: Nobuo Shimizu
- Applicant: Nobuo Shimizu
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2003-418654 20031216
- Main IPC: H01L29/22
- IPC: H01L29/22
Abstract:
A microlens substrate is provided having a plurality of first microlenses and a plurality of second microlenses which are located between the plurality of first microlenses. The second microlenses are smaller than the first microlenses.
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