Invention Grant
- Patent Title: Phase-change material layer and phase-change memory device including the phase-change material layer
- Patent Title (中): 相变材料层和包括相变材料层的相变存储器件
-
Application No.: US11860975Application Date: 2007-09-25
-
Publication No.: US07791932B2Publication Date: 2010-09-07
- Inventor: Bong-Jin Kuh , Yong-Ho Ha , Han-Bong Ko , Doo-Hwan Park , Hee-Ju Shin , Sang-Wook Lim
- Applicant: Bong-Jin Kuh , Yong-Ho Ha , Han-Bong Ko , Doo-Hwan Park , Hee-Ju Shin , Sang-Wook Lim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2006-0094208 20060927
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A phase-change memory device includes a substrate having a contact region, an insulating interlayer on the substrate, a lower electrode electrically connected to the contact region, a phase-change material layer pattern formed on the lower electrode, and an upper electrode formed on the phase-change material layer pattern. The phase-change material layer pattern includes a chalcogenide compound doped with carbon and at least one of nitrogen and metal. The phase-change memory device may have a considerably reduced driving current without increasing a set resistance thereof. Further, the phase-change material layer pattern may have an increased crystallization temperature so as to ensure improved data retention characteristics of the phase-change memory device.
Public/Granted literature
- US20080073637A1 Phase-Change Material Layer and Phase-Change Memory Device Including the Phase-Change Material Layer Public/Granted day:2008-03-27
Information query